This plasma cleaner is a versatile plasma cleaning tool to remove contamination from the surface of samples such as plastic packages, wafers and glass slides in sample preparation and device fabrication. Our systems also can be used for photoresist ashing, ink removal, surface activation and wettability improvement.
Specification:
|
Model |
TCH-2S |
|
Input Power |
AC 220V, 50/60 Hz |
|
RF power |
0-300W |
|
RF frequency |
40KHz (13,56 MHz RF frequency also can be designed according to your need) |
|
Frequency offset |
Less than 0.2KHz |
|
Control Panel |
Control Function: Clean time, RF Power, Vacuum Pump |
|
Process Control |
MCU Automatic and manual mode |
|
Plasma Chamber |
Φ100mm×270mm stainless steel chamber 2 Liter Capacity |
|
Characteristic impedance |
50 Ohm,Automatic matching |
|
Vacuum degree |
10Pa -1000Pa |
|
Cleaning time |
1 to 100 minutes ( adjustable) |
|
Flow rate |
60—600ml/min(adjustable) |
|
Inert Gas |
Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air, and Mixed gas depended on what kind material will be treated. ( not included in the package) |
|
Optional |
Combinations of plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. |
|
Vacuum chamber temperature |
Less than 65°C |
|
Cooling type: |
Forced cooling |
|
Dimensions |
400x450x250 |
|
Net Weight |
36.5kg |
|
Warranty |
One year limited warranty with lifetime support |
