|
Model |
TCH-5S |
|
Input Power |
AC 220V, 50/60 Hz |
|
RF Power |
0-300W |
|
RF frequency |
40KHz |
|
Frequency offset |
Less than 0.2KHz |
|
Control Panel |
Control Function: Clean time, RF Power, Vacuum Pump |
|
Process Control |
MCU Automatic and manual mode |
|
Plasma Chamber |
Φ150mm×270mm, 5 Liter Capacity |
|
Chamber material |
Stainless steel |
|
Characteristic impedance |
50 Ohm,Automatic matching |
|
Vacuum degree |
10Pa -1000Pa |
|
Cleaning time |
1 to 100 minutes( adjustable) |
|
Flow rate |
60—600ml/min(adjustable) |
|
Inert Gas |
Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air, and Mixed gas depended on what kind material will be treated. ( not included in the package) |
|
Optional |
Combinations of plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. |
|
Vacuum chamber temp. |
Less than 65°C |
|
Cooling type |
Forced cooling |
|
Dimensions |
400x450x250 |
|
Net Weight |
37kg |
|
Warranty |
One year limited warranty with lifetime support |
