|
Model |
TCH-20S |
|
Voltage |
AC 220V, 50/60 Hz |
|
RF power |
0-600W adjustable |
|
RF frequency |
40KHZ |
|
Frequency offset |
Less than 0.2KHz |
|
Control Panel |
Control Function: Clean time, RF Power, Vacuum Pump |
|
Process Control |
MCU Automatic and manual mode |
|
Plasma Chamber |
380 ×265×200mm 20 Liter Capacity |
|
Chamber material |
Stainless steel |
|
Characteristic impedance |
50 Ohm,Automatic matching |
|
Vacuum degree |
10Pa -30Pa |
|
Cleaning time |
1 to 99999 seconds( adjustable) |
|
Flow rate |
10—300ml/min(adjustable) |
|
Inert Gas |
Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air, and Mixed gas depended on what kind material will be treated. ( not included in the package) |
|
Optional |
1. Combinations of plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. 2. Vacuum pump with extra cost of USD 420 |
|
Vacuum chamber temp. |
Less than 30°C |
|
Cooling type: |
Forced cooling |
|
Dimensions |
650 ×550×440mm |
|
Warranty |
One year limited warranty with lifetime support |
