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DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater

DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater

BASIC INFO

VTC-600-2HD-LD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc


Specification:

Input/Output Voltage and Power

1. Input voltage:AC220V50Hz/60Hz

2. Total Power:<2Kw


Source Power

Two sputtering power sources are integrated into one control box

1. DC source: 500 W power for coating metallic materials

2. RF source: 300 W power, for coating non-conductive materials

Sputtering power source is optional, you can choose two DC sources, you can also choose two RF sources, or choose one DC one RF sources.

Magnetron  Sputtering Head

    1. Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included .

2. One is connected to DC source for coating metallic materials

3. The other one is connected to RF source for non-conductive materials

4. Target size requirement: 2" diameter

5. Target cooling mode: water cooling

    6. Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)

    7. Customized coater: Two DC heads without RF; two RF heads without DC; 3 RF heads are available upon request

Sample Stage

1. Sample holder is a rotatable and heatable stage

2. Sample holder size: 140 mm Dia. for. 4" wafer max

3. Rotation speed: 1 - 20 rpm adjustable for uniform coating

   4. The holder temperature is adjustable from RT to 500 °C max with accuracy ±1.0 °C via a digital temperature controller

Gas Flow Control

1. Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses .

2. Flow rate:One flow rate is 100SCCM,the other flow rate is 200SCCM

Vacuum Pump Station

Power of theVacuum Pump :300W

Water Chiller

Power of the Water Chiller:350W

Optional

1. Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å

2. Precision Thin Film & Coating Analysis Systems is available at extra cost

3. Various 2” oxide and metallic targets are available upon request at extra cost.

Overall Dimensions

 Host Dimension:500mm×560mm×660mm20" × 22" × 26"

Total Dimension:1300mm×660mm×1200mm52" × 26" × 48"

Net Weight of Coater

160 kg

Compliance

CE approval

Warranty

One year limited warranty with lifetime support

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Company: Zhengzhou TCH Instrument Co., Ltd

Contact: Dorry

Tel: +86 13526477203

Phone: 0086 13526477203

E-mail: tchinstrumenttch@163.com

Address: No.216, Changchun Road, High-Tech Zone, Zhengzhou City, Henan Province, China (450000)

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